Silicon Technologies: Ion Implantation and Thermal Treatment

First published 2011 in Great Britain and the United States by ISTE Ltd and John Wiley & Sons, Inc.

Apart from any fair dealing for the purposes of research or private study, or criticism or review, aspermitted under the Copyright, Designs and Patents Act 1988, this publication may only be reproduced,stored or transmitted, in any form or by any means, with the prior permission in writing of the publishers,or in the case of reprographic reproduction in accordance with the terms and licenses issued by theCLA. Enquiries concerning reproduction outside these terms should be sent to the publishers at theundermentioned address:

ISTE Ltd	John Wiley & Sons, Inc.
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© ISTE Ltd 2011

The rights of Annie Baudrant to be identified as the author of this work have been asserted by her inaccordance with the Copyright, Designs and Patents Act 1988.

Library of Congress Cataloging-in-Publication Data

Silicon technologies : ion implantation and thermal treatment / edited by Annie Baudrant.

p. cm.

Includes bibliographical references and index.ISBN 978-1-84821-231-21. Semiconductor doping. 2. Ion implantation. 3. Semiconductors--Heat treatment. I. Baudrant, Annie.TK7871.85.S5485 2011621.3815'2--dc22

2011008131

British Library Cataloguing-in-Publication Data

A CIP record for this book is available from the British Library

ISBN 978-1-84821-231-2

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