Index
A
accuracy
adherence
adhesion
adjustment
atomic force microscopy (AFM)
algorithm
aspect ratio
average
azobenzene
B
bar
C
capillary
correction
D
deconvolution
de-embossing
deformation
demolding
diffraction
distribution
E
edge effect
elastic
electron
transistor
ellipsometry
evanescent wave
F
flexible
flow
force
fracture
friction
G
goniometry
I
indentation
interaction
interface
L
library
local
M
measurement
metrology
MMFE
N
nano-oxidation
negative resist
O
optical
organo-metallic
P
parameter
PDMS
photon
photosensitive resist
plasmonic
point
polarization
polymer
polymerization
positive resist
pressing
profile
proximity
Q
quantum devices
R
rays
regression
reproducibility
resolution
roughness
S
scatterometry
sensitivity
silane
silicon
silver
statistical
STM
surface energy
T
thermorepeated
threshold
topographical
treatment
U
uncertainty
UV lithography
V
variance
viscosity
volume
X
X-rays
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