J.N. Hilfiker, J.A. Woollam Co., Inc., USA
In situ spectroscopic ellipsometry is a versatile optical measurement technique for characterizing thin films. Ellipsometric measurements commonly determine thin film thickness, growth and etch rates, optical constants, surface and interface quality, composition, and other related material properties. This chapter covers the principles of in situ spectroscopic ellipsometry, considerations for in situ integration, and common applications.
in situ spectroscopic ellipsometry
thin film characterization
realtime process monitoring and control