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In Situ Characterization of Thin Film Growth by G Rijnders, G Koster

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5

In situ spectroscopic ellipsometry (SE) for characterization of thin film growth

J.N. Hilfiker,     J.A. Woollam Co., Inc., USA

Abstract:

In situ spectroscopic ellipsometry is a versatile optical measurement technique for characterizing thin films. Ellipsometric measurements commonly determine thin film thickness, growth and etch rates, optical constants, surface and interface quality, composition, and other related material properties. This chapter covers the principles of in situ spectroscopic ellipsometry, considerations for in situ integration, and common applications.

Key words

in situ spectroscopic ellipsometry

thin film characterization

realtime process monitoring and control

optical monitoring

growth/etch rates

5.1 Introduction ...

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