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In Situ Characterization of Thin Film Growth by G Rijnders, G Koster

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2

Inelastic scattering techniques for in situ characterization of thin film growth: backscatter Kikuchi diffraction

N.J.C. Ingle,     University of British Columbia, Canada

Abstract:

The inherent characteristics of electron diffraction are particularly useful for determining the full structure (lattice parameters, space group, atomic positions) of thin films in situ and in real-time. Electrons are easy to generate, manipulate, and detect, and they have a strong interaction with matter. However, the dynamic nature of electron diffraction generally makes detailed analysis complicated. Along with the multiple scattering complications comes one significant benefit: the formation of Kikuchi diffraction patterns. These contain within them a representation ...

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