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Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications by Richard F. Reidy, Karen A. Reinhardt

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Chapter 6

Filtering, Recirculating, Reuse, and Recycling of Chemicals

Barry Gotlinsky1, Kevin T. Pate2, and Donald C. Grant3

1Pall Corporation, 25 Harbor Park Drive, Port Washington, New York, USA

2Intel Corporation, 2501 MW 229th Street, Hillsboro, Oregon, USA

3CT Associates Incorporated, 7121 Shady Oak Road, Eden Prairie, Minnesota, USA

Abstract

Filtration is a key aspect of contamination control for the manufacturing of integrated circuits. Particulate contaminants can be found in cleaning chemistries – both in bulk distribution as well as in the tools. Particles are also generated from etching and cleaning processes within the tools. Proper choice of filtration materials and design is complex and dependent on the application and tool design with careful consideration of the process. For example, filters can be optimized for single pass or recirculation efficiencies, intended for single wafer spray tools or chemical recirculation batch immersion tools, respectively. Particle metrology is integral to confirmation of particle control, and in combination with proper filtration, will provide high confidence in minimization of particle related contamination. Utilization of chemical management and chemical reuse will reduce the chemicals cost in the fab.

Keywords: filters, filtration, contamination control, point-of-use, recirculation, chemical recycling, chemical reuse, chemical distribution, chemical management, particle counters, bulk chemical delivery, filtration mechanisms, ...

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