First published 2011 in Great Britain and the United States by ISTE Ltd and John Wiley & Sons, Inc. Adapted and updated from Diélectriques ferroélectriques intégrés sur silicium published 2011 in France by Hermes Science/Lavoisier © LAVOISIER 2011
Apart from any fair dealing for the purposes of research or private study, or criticism or review, as permitted under the Copyright, Designs and Patents Act 1988, this publication may only be reproduced, stored or transmitted, in any form or by any means, with the prior permission in writing of the publishers, or in the case of reprographic reproduction in accordance with the terms and licenses issued by the CLA. Enquiries concerning reproduction outside these terms should be sent to the publishers at the undermentioned address:
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Library of Congress Cataloging-in-Publication Data
Ferroelectric dielectrics integrated on silicon / edited by Emmanuel Defaÿ. p. cm. Adapted and updated from: Dielectriques ferroelectriques integres sur silicium, published in France by Hermes Science/Lavoisier, 2011. Includes bibliographical references and index. ISBN 978-1-84821-313-5 1. Ferroelectric thin films. 2. ...
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