Electromigration in Thin Films and Electronic Devices

Index

A

Advanced Photon Source, 100, 105

analytical model, 76–7

ANSYS, 16

antireflective coating, 218

Arrhenius temperature dependence, 7

atomic flux, 73

atomic layer deposition, 215

B

back-end-of-line metal layer, 214

back-end-of-line process, 159

Black’s equation, 7, 14, 175–6, 224, 271–2, 293

Black’s Law, 175

Black’s model, 117, 292

Blech condition, 305–6

Blech effect, 11–13, 124–5

Blech equation, 103

Blech product, 12

Boltzmann constant, 115, 175

Bragg monochromatic diffraction, 79

Bragg’s Law, 140

C

Cahn-Hilliard equation, 34

Cahn-Nye crystal bending model, 156

charge-couple device (CCD), 138

chemical mechanical polishing, 5, 100, 214

chemical vapour deposition, 159, 241, 246

classical continuum modeling, 47–8

‘coincident site lattices, ...