Acronyms
ACAA | Average Coherence Approximation Algorithm |
BL | Boundary Layer |
CD | Critical Dimension |
CMTF | Critical Modulation Transfer Function |
DCT | Discrete Cosine Transform |
DEL | Double Exposure Lithography |
DPL | Double Patterning Lithography |
DUVL | Deep Ultraviolet Lithography |
EBL | E-Beam Lithography |
EUVL | Extreme Ultraviolet Lithography |
FDTD | Finite-Difference Time-Domain Method |
FFT | Fast Fourier Transform |
IC | Integrated Circuit |
ILT | Inverse Lithography Technique |
ITRS | International Technology Roadmap for Semiconductors |
MOS | Metal Oxide Silicon |
MoSi | Molybdenum Silicide |
MTF | Modulation Transfer Function |
NA | Numerical Aperture |
OAI | Off-Axis Illumination |
OPC | Optical Proximity Correction |
PAC | Photoactive Compound |
PCI | Partially Coherent Illumination |
PSF | Point Spread Function |
PSM | Phase-Shifting Mask |
RET | Resolution Enhancement Technique |
SMO | Simultaneous Source and Mask Optimization |
SNR | Signal-to-Noise Ratio |
SOCS | Sum of Coherent System |
SR1 | Symmetric Rank One |
SVD | Singular Value Decomposition |
WG | Waveguide Method |